Micro-NanoFabrication for Photovoltaics Workshop

Description: The Micro-NanoFabrication for Photovoltaics Workshop is an intensive certificate program geared towards introducing technical and business managers to the applications of nanotechnology for photovoltaics.  The program includes a hands-on lab component covering the basic principles and practice of micro-nano fabrication techniques applied to electronic devices.

Participants will become trained in ultra high vacuum physical vapor deposition, lithography, etching and cleaning, metallization, and specimen characterization using scanning electron microscope (SEM). Total duration of the course is 30 hours, consisting of three 2-hour lectures and three 8-hour labs. Lectures will be held from 7 PM - 9 PM on Wednesdays and Labs will be held from 9 AM - 5 PM on Saturdays. Participants are expected to submit written reports on experiments performed.

Course Objectives: This laboratory course covers various fabrication principles and process technologies designed to provide hands-on experience on fabrication and characterization of basic electronic devices, particularly a novel solar cell using organic semiconductors. Students will form groups of two or more during lab projects, but each student will be required to write and submit individual reports.

Objective 1: Provide in-depth theoretical background of each process involved from a design point of view

Objective 2: Give hands-on experience using process materials such as silicon wafers and process equipment to realize a complete device in a fabrication environment

Objective 3: Familiarize students with scanning electron microscope characterization of fabricated specimens in order to interpret and co-relate design parameters with measured parameters

Objective 4: Prepare students to perform engineering duties in an industrial clean-room fab, including preparation of detailed technical reports on the design, fabrication, characterization and interpretation of measured data

Topics Covered: The following topics are covered in the lecture class: Overview of Fabrication Processes, Ultra High Vacuum Process, Photolithography and Mask Layout Techniques, Wafer Characterization, Metallization, Chemistry of Wafer Cleaning and Etching, and Device Physics and Characterization of a novel solar cell using thin film organic semiconductors.

The laboratory work consists of four experiments designed to provide hands on experience on fabrication and characterization of basic electronic devices. The tentative schedule for the lab work includes Orientation of fab, wafer handling techniques, Mask Preparation, Characterization of Si wafers, Wafer Cleaning, and Thin film Aluminum Metallization of device electrodes in a ultra high vacuum evaporator.

Contribution to Professional Component: Most of this course presents engineering physics and chemistry though a significant emphasis on practical applications including fabrication technology that contributes to engineering design. Every effort is made to refer specific topics to the student’s introductory science and mathematics courses in order to reinforce these concepts. In addition, the material is introduced to put the subject of electronic components to provide a link to the student’s general education about computers and other electrical appliances used in everyday life.

Relation to Program Outcomes: This course makes important contributions to many of the Training Program Outcomes of California Institute of Nanotechnology (CINANO) as outlined below.

1. Math/Science/Engr: The course reviews and expands on the device physics and chemistry originally introduced in the physics and chemistry sequences. The mathematical components include emphasis on Electrostatics presented in electromagnetics and physics courses.

2. Engineering Design: Fabrication of real devices requires design of physical dimensions, process and devices parameters. This design aspect is appropriately blended in throughout the course. The students perform design of photolithography masks and devices they fabricate using hand calculations.

3. Engineering Teams: The fabrication projects are performed with minimum two students in a group. The students interact at each step of the design and fabrication process in order to achieve high performance of the device. The students also work together during experimentation and solving assigned problems.

4. Contemporary Issues: The lithography limits, dry etching vs. wet etching, cost effectiveness and material issues, all contemporary issues in this field, are discussed in the context of physics, chemistry and technology topics covered under this course.

5. Professional and Ethical Responsibility: A discussion of acceptable practices in studying and in doing other work within the course helps students reflect on the ethical standards of professional work. Some ethical problems are addressed through the Engineering Handbook.

6. Effective Communication: Emphasis is given to effective communication skills required for this class that include learning the correct terminology and vocabulary pertinent to fab and clean-room environment, process tools and equipment and technology. Progress of design and fabrication is presented and discussed among students and between students and instructor for review and improvement.

7. California Institute of Nanotechnology Goals: Occasional discussions in class of how nanodevices and products are fabricated and used to sensitize the student to the impact of engineering products on society.

Instructor:
Mahmudur Rahman
Associate Professor
Electrical Engineering Department
Santa Clara University

Required Reference: "Laboratory Exercises of Micro-Nano Fabrication Techniques and Application to Photovoltaic Devices,” by M. Rahman.

The next Training Dates: September 3- September 20, 2008

Session 1: Lecture - Wednesday September 3   (7:00 PM - 9:00 PM)
Session 2: Lab - Saturday September 6     (9:00 AM - 5:30 PM)
Session 3: Lecture - Wednesday September 10  (7:00 PM - 9:00 PM)
Session 4: Lab - Saturday September 13  (9:00 AM - 5:30 PM)
Session 5: Lecture - Wednesday September 17  (7:00 PM - 9:00 PM)
Session 6: Lab - Saturday September 20  (9:00 AM - 5:30 PM)

Contact hours: 30 Hours.

Location
California Institute of Nanotechnology
1290 Parkmoor Avenue
San Jose, CA 95126 USA